Apparatus for removing harmful substances of exhaust gas dischar

Gas separation – With nonliquid cleaning means for separating media – Solid agent cleaning member movingly contacts apparatus

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55223, 55431, 95225, 261142, 261155, 261DIG54, 422174, B01D 4706

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056499850

ABSTRACT:
Apparatus for removing harmful substances of an exhaust gas discharged from a semiconductor manufacturing process are provided. The apparatus includes a mechanism for: removing at least one of a water-soluble component, a hydrolyzable component and dust contained in the exhaust gas discharged from semiconductor manufacturing equipment by water scrubbing; heating the water-scrubbed exhaust gas to thermally decompose a thermally-decomposable component contained therein; and removing dust generated by the thermal decomposition from the thermally-decomposed exhaust gas by water scrubbing to render the thermally decomposed exhaust gas into a clean exhaust gas.

REFERENCES:
patent: 3052105 (1962-09-01), Bowman et al.
patent: 3997294 (1976-12-01), Kritzler
patent: 4467614 (1984-08-01), Tropeano et al.
patent: 4600561 (1986-07-01), Frei
patent: 5277707 (1994-01-01), Munk et al.
patent: 5405445 (1995-04-01), Kumada et al.
patent: 5567215 (1996-10-01), Bielawski et al.
Heat Oxidation Decomposition Type for CVD Equipment Exhaust Gas Removal Equipment KT-1000 (brochure) Sumitomo Seika. Publication is believed to be Jul. of 1994. (Japanese and English Transiations).

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