Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...
Patent
1995-05-12
1999-06-01
Tran, Hien
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
With means applying electromagnetic wave energy or...
422141, 422143, 422144, 422146, 422168, 422173, 422177, 422178, 4221863, 422193, 422198, 422223, 422239, B01J 1912
Patent
active
059096136
ABSTRACT:
A method of removing harmful gas is performed by a manner that a mixture of photocatalyzer and active carbon with air containing harmful gas and the mixture of photocatalyzer and active carbon are mixed in a chamber so as to drift the mixture in the air, the drifting mixture reacting with the harmful gas in illumination by lighting means, and the mixture catching said harmful gas so as to remove said harmful gas.
REFERENCES:
patent: 2459425 (1949-01-01), Hemminger
patent: 3094478 (1963-06-01), Harped
patent: 4003711 (1977-01-01), Hishinuma et al.
patent: 4005017 (1977-01-01), Kusano et al.
patent: 4152162 (1979-05-01), Masuda et al.
patent: 4940567 (1990-07-01), Ohlmeyer et al.
patent: 4997576 (1991-03-01), Heller et al.
patent: 5102628 (1992-04-01), De Lasa
patent: 5158754 (1992-10-01), Leters et al.
Kawakami Hitomi
Miyoshi Noriomi
Nishikata Satoshi
Sasamoto Toshiharu
Shinkai Kazuteru
Fuji Electric & Co., Ltd.
Tran Hien
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