Apparatus for removing harmful components in a semiconductor exh

Details Apparatus for removing harmful components in a semiconductor exh Apparatus for removing harmful components in a semiconductor exh

1998-10-19

2000-10-03

Knode, Marian C.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Waste gas purifier

422171, 422172, 422173, 422182, B01D 5334, B01D 5368, B01D 5375

Patent

active

061269069

ABSTRACT:
An apparatus for removing harmful components in a semiconductor exhaust gas includes: a first water scrubber for washing with water a gas to be processed; a gas decomposer tower disposed downstream of the first water scrubber; a second water scrubber disposed downstream of the gas decomposer tower; and a burner tower disposed downstream of the second water scrubber for burning the processed gas, wherein the gas decomposer tower is capable of thermally decomposing a mixture gas of a saturated or unsaturated hydrocarbon gas and a perfluorocarbon or a perfluoride compound by maintaining the mixture gas at a temperature of 600.degree. C. or more in the absence of separated O.sub.2.

REFERENCES:
patent: 3615163 (1971-10-01), Brzozowski
patent: 4125593 (1978-11-01), Scheifley et al.
patent: 4209496 (1980-06-01), Carpenter et al.
patent: 4874587 (1989-10-01), Galloway
patent: 5649985 (1997-07-01), Imamura
patent: 5716428 (1998-02-01), Imamura
patent: 5955037 (1999-09-01), Holst et al.

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