Apparatus for removal of minute particles from a surface...

Electric heating – Metal heating – By arc

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C219S121840, C156S345500, C156S345510, C156S345520, C134S105000

Reexamination Certificate

active

10966029

ABSTRACT:
A method and apparatus for removing minute particles from a surface of a sample are provided that prevent redeposition of the particles onto the surface. By combining thermophoresis with laser assisted particle removal (LAPR), the methods and apparatus remove minute particles (for example, micrometer and nanometer sizes) and assure that they will not redeposit.

REFERENCES:
patent: 4720621 (1988-01-01), Langen
patent: 4752668 (1988-06-01), Rosenfield et al.
patent: 4987286 (1991-01-01), Allen
patent: 5023424 (1991-06-01), Vaught
patent: 5151135 (1992-09-01), Magee et al.
patent: 5332879 (1994-07-01), Radhakrishnan et al.
patent: 5373806 (1994-12-01), Logar
patent: 5516369 (1996-05-01), Lur et al.
patent: 5531857 (1996-07-01), Engelsberg et al.
patent: 5531862 (1996-07-01), Otsubo et al.
patent: 5601737 (1997-02-01), Asahi et al.
patent: 5637245 (1997-06-01), Shelton et al.
patent: 5643472 (1997-07-01), Engelsberg et al.
patent: 5800625 (1998-09-01), Engelsberg et al.
patent: 5821175 (1998-10-01), Engelsberg
patent: 5950071 (1999-09-01), Hammond et al.
patent: 5958145 (1999-09-01), Yonemizu et al.
patent: 5958268 (1999-09-01), Engelsberg et al.
patent: 6048588 (2000-04-01), Engelsberg
patent: 6056827 (2000-05-01), Fukui et al.
patent: 6064035 (2000-05-01), Toller et al.
S.D. Allen, J.O. Porteus and W.N. Faith, Infrared laser-induced desorption of H2O and hydrocarbons from optical surfaces, Appl. Phys. Lett. vol. 41(5), pp. 416-418 (1982).
S.D. Allen, J.O. Porteus, W.N. Faith, and J.B. Franck, Contaminant and defect analysis of optical surfaces by infrared laser induced desorption, Appl. Phys. Lett. vol. 45(9), pp. 997-999 (1984).
J.O. Porteus, J.B. Franck, S.C. Seitel and S.D. Allen, Defect characteristics of optical surfaces using pulsed laser damage methods, Optical Engineering vol. 25, No. 10, pp. 1171-1176 (1986).
W. Zapka, W. Ziemlich and A.C. Tam, Efficient pulsed laser removal of 0.2μm sized particles from a solid surface, Appl. Phys. Lett. vol. 58 (20), pp. 2217-2219 (1991).
M. Genut, B. Livshits, Y. Uziel, O. Tehar-Zahav, E. Iskevitch, I. Barzilay, Laser removal of foreign materials from semiconductor wafers, Proc. SPIE vol. 3274, pp. 90-99 (1998).
D. Yogev, M. Engel, S. Zeid, I. Barzilay, and B. Livshits, Laser chemical process for clean applications in semiconductor manufacturing, Proc. SPIE 3933, pp. 77-87 (2000).
J.D. Kelley, M.I. Stuff, F.E. Hovis and G.J. Linford, Removal of small particles from surfaces by pulsed laser irradiation: observations and a mechanism, Proc. SPIE 1415, pp. 211-219 (1991).
Y.F. Lu, W.D. Song, C.K. Tee, D.S-H. Chan, and T.S. Low, Wavelength effects in the laser cleaning process, Jpn. J. Appl. Phys. vol. 37, pp. 840-844 (1998).
V. Dobler, R. Oltra, J.P. Boquillon, M. Mosbacher, J. Boneberg and P. Leiderer, Surface acceleration during dry laser cleaning of silicon, Appl. Phys. A 69, pp. S335-S339 (1999).
M. She, Dongsik Kim and C.P. Grigoropoulos. Liquid-assisted pulsed laser cleaning using near-infrared and ultraviolet radiation, J. Appl. Phys. vol. 86, No. 11, pp. 6519-6524 (1999).
A. Miller, S.J. Lee, S.D. Allen, Laser assisted particle removal “dry” cleaning of critical surfaces, Mater. Sci. Eng. B49, pp. 85-88 (1997).
C.T. Avedisian, The Homogeneous Nucleation of Limits of Liquids, J. Phys. Chem. Ref. Data vol. 14, No. 3, pp. 695-729 (1985).
O. Yavas, P. Leiderer, H.K. Park, C.P. Grigoropoulos, C.C. Poon, W.P. Leung, N. Do and A.C. Tam, Optical Reflectance and Scattering Studies of Nucleation and Growth of Bubbles at a Liquid-Solid Interface Induced by Pulsed Laser Heating, Phys. Rev. Lett., vol. 70, No. 12, pp. 1830-1833 (1993).
A.C. Tam, H.K. Park and C.P. Grigoropoulos, Laser Cleaning of Surface Contaminants, Appl. Surf. Sci. 127-129, pp. 721-725 (1998).
J.B. Heroux, S. Boughaba, I. Ressejac, E. Sacher and M. Meunier, CO2laser-assisted removal of submission particles from solid surfaces, J. Appl. Phys. 79(6), pp. 2857-2862 (1996).
M. Mosbacher, H-J. Munzer, J. Zimmermann, J. Solis, J. Boneberg & P. Leiderer, Optical field enhancement effects in laser-assisted particle removal, Appl. Phys. A 72, pp. 41-44 (2001).
D.R. Halfpenny and D.M. Kaner, A quantitive analysis of single pulse ultraviolet dry laser cleaning, J. Appl. Phys. vol. 86, No. 12, pp. 6641-6646 (1999).
X. Wu, E. Sacher and M. Meunier, The modeling of eximer laser particle removal from hydrophilic silicon surfaces, J. Appl. Phys. vol. 87, No. 8, pp. 3618-3627 (2000).
G. Vereecke, E. Rohr and M.M. Heyns, Laser-assisted removal of particles on silicon wafers, J. Appl. Phys. vol. 85, No. 7, pp. 3837-3843 (1999).
Y.F. Lu, Y.W. Zheng, W.D. Song., An energy approach to the modelling of particle removal by pulsed laser irradiation, Appl. Phys. A 68, pp. 569-572 (1999).
K. Mann, B. Wolff-Rottke and F. Muller, Cleaning of optical surfaces by eximer laser radiation, Appl. Surf. Sci. 96-98, pp. 463-468 (1996).
J. Adler, R.K. Sin, Y. Rabinovich and B. Moudgil, “Adhesion between Nanoscale Rough Surfaces,”Journal of Colloid and Interface Science, pp. 10-24 (Aug. 1999).
Q. Chen, H.W. Lee, S. Allen, Bubble Formation and Growth in Liquid Encapsulated Laser Vapor Deposition,Tulane Laser Micro Fabrication Lab, pp. 113-119.
A.C. Engelsberg, Transition from laboratory to manufacturing for a dry, laser-assisted cleaning technology, SPIE vol. 3274, pp. 100-109 (1998).
R.G. Horn, and D.T. Smith, Contact Electrification and Adhesion Between Dissimilar Materials, Science vol. 256, pp. 362-364 (1992).
M.Y. Hussaini, P. Rasetarinera, An efficient implicit discontinuous spectral Galerkin method, Journal of Computational Physics vol. 172, pp. 718-738 (2001).
K. Imen, S.D. Allen, S. Lee, Laser-assisted microscale particle removal, Appl. Phys. Lett. 58(2), pp. 203-205 (1991).
S.J. Lee, K. Imen, S.D. Allen, CO2Laser assisted particle removal threshold measurements, Appl. Phys. Lett. 61(19), pp. 2314-2316 (1992).
S.J. Lee, K. Imen, S.D. Allen, Shock wave analysis of laser particle removal, J. Appl. Phys. 74(12), pp. 7044-7047 (1993).
S.J. Lee, S.D. Allen, S. Miller, Materials Science Engineering B 49, p. 85 (1997).
P.T. Leung, N. Do, Leander Klees, W.P.Leung, Frank Tong, L. Lam, W. Zapka and A.C. Tam, Transmission studies of explosive vaporization of a transparent liquid film on an opaque solid surface induced by excimer-laser-pulsed irradiation, J. Appl. Phys. 72 (6), pp. 2256-2263 (1992).
Y.K. Lu, W.D. Song, K.D. Ye, Y.P. Lee, D.S.H. Chan and T.S. Low, A cleaning model for removal of particles due to laser-induced thermal expansion of substrate surface, Jpn. J. Appl. Phys. vol. 36, pp. L1304-L1306 (1997).
Y.K. Lu, W.D. Song, Y. Zhang, M.H. Hong, T.S. Low, A theoretical model for laser removal of particles from solid surfaces, Applied Physics A 65, pp. 9-13 (1997).
Y.K. Lu, Y.W. Zheng, and W.D. Song, Laser induced removal of spherical particles from silicon wafers, J.Appl. Phys. vol. 87, No. 3, pp. 1534-1539 (2000).
M. Mosbacher, N. Chaoui, J. Siegel, V. Dobler, J. Solis, J. Boneberg, C.N. Afonso, P. Liederer, A comparison of ns and ps steam laser cleaning of Si surfaces, Appl. Phys. A 69, pp. S331-S334 (1999).
M. Mosbacher, V. Dobler, J. Boneberg, P. Liederer, Universal threshold for the steam laser cleaning of submicron spherical particles from silicon, Appl. Phys. A70, pp. 669-672 (2000).
H.K. Park, C.P. Grigoropoulos, W.P. Leung, A.C. Tam, A practical excimer laser-based cleaning tool for removal of surface contaminants, IEEE Transactions on Components, Packaging and Manufacturing Technology—Part A, vol. 17, No. 4, pp. 631-643 (1994).
N.W. Pu, J. Bokor, S. Jeong, R. Zhao, Nondestructive ps-ultrasonic characterization of Mo/Si extreme UV multiplayer reflection coatings, J. Vac. Sci. Technol. B17 (6), pp. 3014-3523 (1999).
A.C. Tam, W.P. Leung, W. Zapka, W. Ziemlich, Laser-cleaning techniques for removal of surface particles, J. Appl. Phys. 71 (7), pp. 3515-3523 (1992).
O. Yavas, A. Schilling, J. Bischof, J. Boneberg, P. Leiderer, Bubble nucleation and pressure generation during laser cleaning of surfaces, Appl. Phys. A, 64, pp. 331-339 (1997).
S. Miller, D

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for removal of minute particles from a surface... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for removal of minute particles from a surface..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for removal of minute particles from a surface... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3830778

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.