Apparatus for regulating the evaporation rate of oxidizable subs

Details Apparatus for regulating the evaporation rate of oxidizable subs Apparatus for regulating the evaporation rate of oxidizable subs

1981-05-04

1983-10-11

Smith, John D.

Coating apparatus

Control means responsive to a randomly occurring sensed...

Responsive to condition of coating material

118663, 118690, 118715, 118726, C23C 1312

Patent

active

044085630

ABSTRACT:
An apparatus for regulating the evaporation rate of oxidizable substances in reactive vacuum deposition by the metered addition of oxygen to a vacuum deposition chamber during deposition, wherein the addition of oxygen to a predetermined value, the pressure "p" in the vacuum chamber is measured, and the evaporation rate "r" for any pressure changes is regulated such that the ratio of pressure to evaporation rate p:r is maintained substantially constant.

REFERENCES:
patent: 3316386 (1967-04-01), Yatte et al.
patent: 3919968 (1975-11-01), Sandmann et al.
patent: 3962488 (1976-06-01), Gillery
Anastasio, T. A., "Dielectric Properties of Films Formed by Vacuum Evaporation of Silicon Monoxide", J. Appl. Phys., vol. 38, pp. 2606-2610, 1967.

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