Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...
Patent
1991-08-09
1992-12-22
Warden, Robert J.
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
With means applying electromagnetic wave energy or...
422129, 250504R, 250504H, 362109, 362154, 362216, G01J 0000, F21V 3300
Patent
active
051732696
ABSTRACT:
Containers (20-20) which held UV curable acrylate materials commonly used as coating materials for drawn optical fiber are treated prior to disposal. Because of the presence of acrylate residues therewithin, the container cannot be disposed of in a landfill and has been incinerated. This problem has been overcome by exposing the residue within the container to suitable reproducible radiation determined in accordance with the photchemistry of the residue materials to cure completely the remaining acrylate material and thereby reduce its reactivity.
REFERENCES:
patent: 1965947 (1934-07-01), Prouty
patent: 2525022 (1950-10-01), Dupuy
patent: 2586625 (1952-02-01), Downey
patent: 3826014 (1974-07-01), Helding
patent: 3970856 (1976-07-01), Mahaffey et al.
patent: 4131563 (1978-12-01), Bahr
patent: 4276479 (1981-06-01), Mibu et al.
patent: 4298822 (1981-11-01), Fukuda
patent: 4390432 (1983-06-01), Takeguchi et al.
patent: 4409263 (1983-10-01), Aloisio
patent: 4764305 (1988-08-01), de Tassigny
patent: 4849183 (1989-07-01), Kuriyama
patent: 4864145 (1989-09-01), Burgio, Jr.
Mon Joseph M.
Petisce James R.
AT&T Bell Laboratories
Hayes, Jr. Donald E.
Trembley T. A.
Warden Robert J.
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