Apparatus for reducing the intensity and frequency of arcs which

Details Apparatus for reducing the intensity and frequency of arcs which Apparatus for reducing the intensity and frequency of arcs which

1995-05-09

1997-04-01

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 20419222, 20419223, 20429819, 20429823, 20429824, C23C 1435, C23C 1454

Patent

active

056162243

ABSTRACT:
An apparatus for reducing the intensity and frequency of arcing in a reactive DC sputtering process when the process uses an arc-suppression system which interrupts or reverses the voltage applied to the sputtering target. A plasma having required properties is introduced into the vicinity of the sputtering target by means of a separate plasma applicator which operates independently of the target.

REFERENCES:
patent: 4851095 (1989-07-01), Scobey et al.
patent: 5286360 (1994-02-01), Szczyrbowski et al.
patent: 5397448 (1995-03-01), Gesche et al.
patent: 5427669 (1995-06-01), Drummond
patent: 5478459 (1995-12-01), Latz

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