Thermal measuring and testing – Temperature measurement – Nonelectrical – nonmagnetic – or nonmechanical temperature...
Patent
1995-06-07
1998-04-21
Gutierrez, Diego F.F.
Thermal measuring and testing
Temperature measurement
Nonelectrical, nonmagnetic, or nonmechanical temperature...
374120, G01K 1100
Patent
active
057410704
ABSTRACT:
A sensor (100) for measuring semiconductor wafer (10) temperature in semiconductor processing equipment (30), comprising a first laser (104) to provide a first laser beam at a first wavelength and a second laser (106) to provide a second laser beam at a second wavelength. The sensor also includes a laser driver (108) and an oscillator (110) to modulate the wavelength of the first and second laser beams as the laser beams are directed to and reflected from the wafer (10), and a detector module (130) to measure the change in specular reflectance of the wafer (10) resulting from the modulation of the wavelength of the first and second laser beams. The sensor system also includes signal processing circuitry (138) to determine rms surface roughness of the wafer (10) at a known reference temperature from the change in reflectance of wafer (10) resulting from modulation of the wavelengths of the first and second laser beams, and to determine the temperature of wafer (10) from the change in specular reflectance of wafer (10) resulting from modulation of the wavelengths of the first and second laser beams while wafer (10) is at an unknown temperature and the surface roughness of the wafer at the known temperature.
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English abstract and a figure of JP 5010830, published Jan. 19, 1993 (JP 910183602, 28 Jun. 1991).
Brady W. James
Donaldson Richard L.
Gutierrez Diego F.F.
Hoel Carlton H.
Texas Instruments Incorporated
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