Apparatus for rapid plasma treatments and method

Coating apparatus – Gas or vapor deposition – Running length work

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118723, 118724, 118730, 42218605, C23C 1650

Patent

active

052244415

ABSTRACT:
A plasma treating apparatus is useful for coating substrates with thin films having vapor barrier properties at relatively rapid deposition rates. The apparatus comprises an evacuable chamber, an electrically powered electrode defining a plasma-facing surface within the chamber, and a shield spaced a distance .DELTA. transverse to the plasma-facing surface. During plasma treatments, the plasma is confined to within distance .DELTA. while a substrate is continuously fed through the confined plasma.

REFERENCES:
patent: 3898952 (1975-08-01), Shirahata et al.
patent: 4277516 (1981-07-01), Behn et al.
patent: 4384918 (1983-05-01), Abe
patent: 4400410 (1983-08-01), Green et al.
patent: 4551310 (1985-11-01), Imada et al.
patent: 4557946 (1985-12-01), Sacher et al.
patent: 4559112 (1985-12-01), Tamamura et al.
patent: 4599678 (1986-07-01), Wertheimer et al.
patent: 4741801 (1988-05-01), Coleman
patent: 4842707 (1989-06-01), Kinoshita
patent: 4847469 (1989-07-01), Hofmann et al.
patent: 4863756 (1989-09-01), Hartig et al.
patent: 4920917 (1990-05-01), Nakatani et al.
patent: 4960073 (1990-10-01), Suzuki et al.
patent: 4968918 (1990-11-01), Kondo et al.
patent: 4986890 (1991-01-01), Setoyama et al.
patent: 4991542 (1991-02-01), Kohmura et al.
patent: 4997519 (1991-03-01), Kondo et al.
patent: 5009738 (1991-04-01), Gruenwald et al.
patent: 5013416 (1991-05-01), Murayama et al.
patent: 5041304 (1991-08-01), Kusano et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for rapid plasma treatments and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for rapid plasma treatments and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for rapid plasma treatments and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1683350

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.