Coating apparatus – Gas or vapor deposition – Running length work
Patent
1991-09-27
1993-07-06
Hearn, Brian E.
Coating apparatus
Gas or vapor deposition
Running length work
118723, 118724, 118730, 42218605, C23C 1650
Patent
active
052244415
ABSTRACT:
A plasma treating apparatus is useful for coating substrates with thin films having vapor barrier properties at relatively rapid deposition rates. The apparatus comprises an evacuable chamber, an electrically powered electrode defining a plasma-facing surface within the chamber, and a shield spaced a distance .DELTA. transverse to the plasma-facing surface. During plasma treatments, the plasma is confined to within distance .DELTA. while a substrate is continuously fed through the confined plasma.
REFERENCES:
patent: 3898952 (1975-08-01), Shirahata et al.
patent: 4277516 (1981-07-01), Behn et al.
patent: 4384918 (1983-05-01), Abe
patent: 4400410 (1983-08-01), Green et al.
patent: 4551310 (1985-11-01), Imada et al.
patent: 4557946 (1985-12-01), Sacher et al.
patent: 4559112 (1985-12-01), Tamamura et al.
patent: 4599678 (1986-07-01), Wertheimer et al.
patent: 4741801 (1988-05-01), Coleman
patent: 4842707 (1989-06-01), Kinoshita
patent: 4847469 (1989-07-01), Hofmann et al.
patent: 4863756 (1989-09-01), Hartig et al.
patent: 4920917 (1990-05-01), Nakatani et al.
patent: 4960073 (1990-10-01), Suzuki et al.
patent: 4968918 (1990-11-01), Kondo et al.
patent: 4986890 (1991-01-01), Setoyama et al.
patent: 4991542 (1991-02-01), Kohmura et al.
patent: 4997519 (1991-03-01), Kondo et al.
patent: 5009738 (1991-04-01), Gruenwald et al.
patent: 5013416 (1991-05-01), Murayama et al.
patent: 5041304 (1991-08-01), Kusano et al.
Chatham, III Hood
Countrywood Joseph
Felts John T.
Nelson Robert J.
Baskin Jonathan D.
Cassett Larry R.
Draegert David A.
Hearn Brian E.
The BOC Group Inc.
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