X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1997-03-25
1998-12-08
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 79, 378 87, G01N 2320
Patent
active
058481222
ABSTRACT:
An apparatus for making rapid in-situ thermal stress measurements includes a controlled atmosphere test chamber for receiving and holding a test sample, and a heating zone within the test chamber confined to the near vicinity of the test sample. A test sample holder, a test sample heater, an x-y translation stage and a rotating stage are mounted within the test chamber. An X-ray source is positioned for producing an incident X-ray beam directed at the test sample from different inclination angles. The incident X-ray beam passes through a long but narrow X-ray window in the test chamber, diffracts from the test sample back through the same X-ray window and continues outside of the chamber to an X-ray detector. The diffracted X-ray beam is converted to light. The light is transmitted through optical fibers and is detected by a CCD array. The invention uses an advantageous scintillation material and a slow scan, fiber-optic compatible CCD photo-sensor array. This photo-sensor array enables the use of a long active detector along the 2.theta. arc and a long working distance between the test sample and the detector.
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Advanced Technology & Materials Inc.
Hultquist Steven J.
Porta David P.
Zitzmann Oliver A.M.
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