Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus – For crystallization from liquid or supercritical state
Reexamination Certificate
2011-08-23
2011-08-23
Kunemund, Robert M (Department: 1714)
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
For crystallization from liquid or supercritical state
C117S010000, C117S056000, C117S074000
Reexamination Certificate
active
08002893
ABSTRACT:
In a Czochralski (CZ) single crystal puller equipped with a cooler and a thermal insulation member, which are to be disposed in a CZ furnace, smooth recharge and additional charge of material are made possible. Further, elimination of dislocations from a silicon seed crystal by use of the Dash's neck method can be performed smoothly. To these ends, there is provided a CZ single crystal puller, wherein a cooler and a thermal insulation member are immediately moved upward away from a melt surface during recharge or additional charge of material or during elimination of dislocations from a silicon seed crystal by use of the Dash's neck method.
REFERENCES:
patent: 5853480 (1998-12-01), Kubota et al.
patent: 5863326 (1999-01-01), Nause et al.
patent: 5865887 (1999-02-01), Wijaranakula et al.
patent: 5885347 (1999-03-01), Tomioka et al.
patent: 5900059 (1999-05-01), Shimanuki et al.
patent: 5900060 (1999-05-01), Nause et al.
patent: 5997635 (1999-12-01), Kubota et al.
patent: 6036776 (2000-03-01), Kotooka et al.
patent: 6090198 (2000-07-01), Aydelott
patent: 6117402 (2000-09-01), Kotooka et al.
patent: 6190452 (2001-02-01), Sakurada et al.
patent: 6299982 (2001-10-01), Tamatsuka et al.
patent: 6364947 (2002-04-01), Iida et al.
patent: 6569236 (2003-05-01), Morimoto et al.
patent: 6632280 (2003-10-01), Hoshi et al.
patent: 6702892 (2004-03-01), Okui et al.
patent: 6733585 (2004-05-01), Inagaki et al.
patent: 6767400 (2004-07-01), Kubo et al.
patent: 6858076 (2005-02-01), Nakajima et al.
patent: 6977010 (2005-12-01), Inagaki et al.
patent: 7244309 (2007-07-01), Ebi et al.
patent: 7727334 (2010-06-01), Inagaki et al.
patent: 2002/0144641 (2002-10-01), Inagaki et al.
patent: 2003/0154907 (2003-08-01), Inagaki et al.
patent: 2005/0268840 (2005-12-01), Inagaki et al.
patent: 2007/0256625 (2007-11-01), Inagaki et al.
patent: 2008/0311019 (2008-12-01), Inagaki et al.
patent: 2008/0311021 (2008-12-01), Inagaki et al.
patent: 56-45889 (1981-04-01), None
patent: 58-217493 (1983-12-01), None
patent: 3-80338 (1991-12-01), None
patent: 4-317491 (1992-11-01), None
patent: 8-239291 (1996-09-01), None
patent: 10-098047 (1998-04-01), None
patent: 10-208987 (1998-08-01), None
patent: 11-092272 (1999-04-01), None
patent: 11-189488 (1999-07-01), None
patent: 2000-154095 (2000-06-01), None
patent: 2000-264779 (2000-09-01), None
Office Action for U.S. Appl. No. 11/809,357 dated Jan. 5, 2009.
Dash; “Growth of Silicon Crystals Free From Dislocations,” Journal of Applied Physics, vol. 30 (4), Apr. 1999, pp. 459-474.
Office Action for related U.S. Appl. No. 11/981,476.
Ebi Daisuke
Hayashi Kengo
Hiraishi Yoshinobu
Monden Hiroshi
Morimoto Shigeo
Husch & Blackwell LLP
Komatsu Denshi Kinzoku Kabushiki Kaisha
Kunemund Robert M
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