Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus – For crystallization from liquid or supercritical state
Patent
1997-05-23
1999-09-21
Hiteshew, Felisa
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
For crystallization from liquid or supercritical state
117218, 117222, C30B 3500
Patent
active
059548754
ABSTRACT:
An apparatus for pulling silicon single crystal comprises a main apparatus body, a crucible disposed therein and comprised of a quartz crucible part and a crucible protection part, a heating member disposed at the outside of the crucible therearound, a temperature keeping cylindrical body disposed at the outside of the heating member, and a heat insulating material disposed between the temperature keeping cylindrical body and the main apparatus body, in which at least an inside upper region of the temperature keeping cylindrical body and/or the crucible protection part made from a carbonaceous material is covered with a thermally decomposed carbon film.
REFERENCES:
patent: 5363796 (1994-11-01), Kobayashi et al.
patent: 5476679 (1995-12-01), Lewis et al.
patent: 5575847 (1996-11-01), Karamochi et al.
patent: 5578123 (1996-11-01), Vilzmann et al.
patent: 5707447 (1998-01-01), Schulmann et al.
Kato Koji
Sato Masayuki
Takagi Takashi
Hiteshew Felisa
Ibiden Co. Ltd.
LandOfFree
Apparatus for pulling silicon single crystal does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for pulling silicon single crystal, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for pulling silicon single crystal will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-76256