Apparatus for projecting a pattern on a semiconductor substrate

Details Apparatus for projecting a pattern on a semiconductor substrate Apparatus for projecting a pattern on a semiconductor substrate

1985-01-23

1986-06-03

Hayes, Monroe H.

Photocopying

Projection printing and copying cameras

Step and repeat

355 43, 355 54, G03B 2742

Patent

active

045926506

ABSTRACT:
An apparatus for determining the focus state of a system for the projection exposure of a mask on a semiconductive substrate for producing integrated circuits without relatively displacing the mask, projection objective and substrate along the common optical axis, utilizes an arrangement for varying cyclically the optical path length for rays at least arising from a projected image on the substrate and running through the objective to a detector plane so that an intensity measurement of the light intensity at this plane indicates the path length required for sharpness and hence the focus state of the projection assembly.

REFERENCES:
patent: 4357100 (1982-11-01), Mayer et al.
patent: 4405229 (1983-09-01), Mayer
patent: 4498762 (1985-02-01), Uehara et al.

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