Apparatus for producing titanium crystal and titanium

Chemistry: electrical and wave energy – Apparatus – Electrolytic

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2042302, 204245, 204247, 204274, C25C 328, C25C 700

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active

060248475

ABSTRACT:
Described is a method and apparatus for producing high purity titanium and high purity titanium so produced. The process contemplates producing titanium sponge in a container and performing titanium fused salt electrolysis in situ in the same container to produce high purity titanium crystal, and where especially low oxygen content is desired, to treat the high purity titanium crystal as produced with iodine.

REFERENCES:
patent: Re34598 (1994-05-01), Shimotori et al.
patent: 2943032 (1960-06-01), Benner
patent: 3087873 (1963-04-01), Slatin
patent: 3114685 (1963-12-01), Alpert
patent: 4381976 (1983-05-01), Armand
patent: 4670121 (1987-06-01), Ginatta et al.
patent: 4793854 (1988-12-01), Shimotori et al.
patent: 4891066 (1990-01-01), Shimotori et al.
patent: 5196916 (1993-03-01), Ishigami et al.
patent: 5336378 (1994-08-01), Nishimura et al.
M-A Nicolet et al., "Diffusion Barriers in Layered Contact Structures", J. Vac. Sci. Technol 19(3), Sep./Oct. 1981, pp. 786-793.
H. Smith et al., "Electron-Bombardment Melting", Journal of Metals, Feb. 1959, pp. 112-117.
S.C. Liang, Impurities in Refractory Metals/Silicides, J. Vac Sci. Technol B2(4), Oct.-Dec. 1984, pp. 714-717.
D.H. Baker, Jr. et al., "Titanium Electrorefining Cathode Studies and Deep Bath Deposition", Bureau of Mines Report of Investigation 5481, 1958, pp. 1-11.
G.T. Murray, "Preparation and Characterization of Pure Metals", Metals Handbook, Ninth Edition, vol. 2, Properties and Selection: Nonferrous Alloys and Pure Metals, ASM, 1979, pp. 709-712, (No month).
M. Nardin et al., "Continuous Production of Titanium from Ticl.sub.4 in Molten Salts", The Institute of Mining and Metallurgy, Proceedings of a symposium held in Grenoble, France, Sep. 1977, pp. 38-41.
R. Bunshah et al., Deposition Technologies for Films and Coatings, "Developments and Applications", 1982, pp. 178-179 (No month).
R. Bunshah et al., Deposition Technologies for Films and Coatings, "Developments and Applications", 1982, pp. 232-233 (No month).
Y. Yoshimura et al., "Production of High Purity Titanium by the Iodide Process", Materia Japan, vol. 33, No. 1, 1994, pp. 48-50 (with English translation) (No month).
R. Rolsten, "Periodic System, Fourth Subgroup: Titanium, Zirconium, Hafniu, Thorium", Iodide Metals and Metal Iodides, Chapter 4, 1961, pp. 18-41 (No month).
Ghate, "Deposition Technologies for Thin Films and Coatings", 1982 p. 518 (No month).
G. Dieter, Jr., "Deformation by Slip", Mechanical Metallurgy, Chapter 4 Section 4.9), 1961, pp. 90-93 (No month).
Dieter, Jr., "Mechanical Metallurgy", Metallurgy and Metallurgical Engineering Series, 1961, pp. 104-105 and 90-93 (No month).
M. Nardin et al., "Electrochemical Reduction of TiCl.sub.4 in Baths of Low-melting-point Chlorides", The Institute of Mining and Metallurgy, Proceedings of a symposium held in Grenoble, France, Sep. 1977, pp. 35-37.
J. Bigot, "Preparation du Titane De Haute Purete Par Le Procede Van Arkel", Centre d'Etudes de Chimie Metallurgique, C.N.R.S., Vitry/Seime (France) Oct. 1975, pp. 151-155 (no translation).
Concise Science Dictionary, pp. 663 and 659-660, 1984 (No month).
Harada, Sodium-Reduced Titanium Sponge, Chitaniumu Jirukoniumu, vol. 30, No. 2, pp. 83-89, 1982 (No month) (abstract only).

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