Apparatus for producing synthetic quartz glass

Details Apparatus for producing synthetic quartz glass Apparatus for producing synthetic quartz glass

2005-07-26

2005-07-26

Griffin, Steven P. (Department: 1731)

Glass manufacturing

Fiber making apparatus

Having coating or treating means

C065S532000

Reexamination Certificate

active

06920766

ABSTRACT:
A synthetic quartz glass preform is produced by flame hydrolysis with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. The preform has a core area which contains ≧1150 ppm OH, a strain double refraction of ≦5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of ΔT ≦0.1%/cm thickness. The quartz glass has been exposed to the following radiation: wavelength λ1=248 nm, laser shot frequency ≧300 Hz, laser shot value ≧109and lumination ≦10 mJ/cm2, and wavelength λ2=193 nm, laser shot frequency ≧300 Hz, laser shot value ≧109and lumination <5 mJ/cm2. Apparatus for producing the preform comprises a horizontally positioned muffle with two different sized openings facing each other. The larger of the openings is for removing the preform, the smaller opening being for introducing a burner. The internal chamber of the muffle narrows from the larger opening to the smaller opening.

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patent: 63-248734 (1998-10-01), None

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