Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...
Patent
1998-03-18
2000-03-14
Stinson, Frankie L.
Cleaning and liquid contact with solids
Apparatus
Sequential work treating receptacles or stations with means...
134 953, 1341022, 134902, B08B 302
Patent
active
060358718
ABSTRACT:
Provided is an apparatus for producing semiconductor and other devices, which can improve the quality of deposited films and increase the yield of produced devices in comparison with the conventional apparatus. The apparatus of the invention comprises a plurality of dry treatment chambers (7a, 7b, 7c, 7d, 7e), a transfer room (6) interconnecting the dry treatment chambers (7a, 7b, 7c, 7d, 7e), loading/unloading chambers (8a, 8b, 8c, 8d), and a cleaning apparatus (13). The transfer room (6) and the cleaning apparatus (13) are directly or indirectly connected to each other.
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Frontec Incorporated
Stinson Frankie L.
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