Apparatus for producing semiconductors

Details Apparatus for producing semiconductors Apparatus for producing semiconductors

1988-09-12

1990-08-28

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118725, 118728, 118730, 4272555, C23C 1600

Patent

active

049516035

ABSTRACT:
Apparatus for continuously producing semiconductor films on substrates in a vacuum chamber. A plurality of reaction chambers are provided within the vacuum chamber, substrates are supported by a top plate and transferred to each reaction chamber, which are filled with a certain reactant gas mixture while the substrates are heated from above the reaction chamber. Continuous treatment of the substrates is provided with an increase in reactant gas utilization efficiency. Disturbance of reactant gas flow by thermal convection is prevented and semiconductor layers having smooth surfaces are formed.

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