Apparatus for producing semiconductor devices

Details Apparatus for producing semiconductor devices Apparatus for producing semiconductor devices

1988-08-23

1990-05-01

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118728, 118500, 156345, C23C 1600

Patent

active

049209205

ABSTRACT:
An apparatus for producing semiconductor devices has a hollow reaction tube which receives a boat carrying a row of a multiplicity of semiconductor wafers held in vertical posture. A flow stabilizing member is disposed in the vicinity of the wafer which is on the downstream end of the wafer row as viewed in the direction of flow of a treating gas introduced into the reaction tube. The flow stabilizing member has such configuration as to progressively converge towards the downstream end of the reaction tube and the maximum-diameter of the flow stabilizing member is substantially the same as that of the wafer. The flow stabilizing member effectively prevents generation of any turbulency of the reaction gas in the region near the downstream end of the reaction tube so that induction of air into the reaction tube which may otherwise be caused by the turbulency is avoided. In consequence, degradation of the quality of product semiconductor devices is avoided and yield is improved.

REFERENCES:
patent: 4154192 (1979-05-01), Tsubouchi
patent: 4487161 (1984-12-01), Hirata

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