Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1989-09-28
1991-12-31
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Multizone chamber
118722, 118725, 118501, C23C 1600
Patent
active
050762044
ABSTRACT:
An apparatus for producing semiconductor devices. A first automatic carrying system operates for taking from a lead frame tray a lead frame which mounts thereon semiconductor chips and for setting the lead frame on the suscepter. A thin film forming device operates for forming an insulating film on a surface of the lead frame disposed on the suscepter. A second automatic carrying system operates for taking from the suscepter the lead frame formed with the insulating film and for setting the lead frame into another lead frame tray. A transferring device operates for transferring the lead frame disposed on the suscepter from the first automatic carrying system through the thin film forming device to the second automatic carrying system.
REFERENCES:
patent: 4430149 (1984-02-01), Berkman
patent: 4587002 (1986-05-01), Bok
Rosler, Automation in CVD Processing, Solid State Technology, Jul. 1977, pp. 27-33.
Bueker Richard
NEC Corporation
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