Apparatus for producing semiconductor device

Coating apparatus – Gas or vapor deposition – Multizone chamber

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156345, 20429825, 20429835, C23C 1600

Patent

active

059320141

ABSTRACT:
A semiconductor device producing apparatus includes a first transporter which moves a substrate to a first unit to undergo at least a first process, and a second transporter, other than the first transporter, which moves the substrate to a second unit, to undergo at least a second process.

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patent: 5421889 (1995-06-01), Pollock et al.

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