Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1996-11-13
1999-08-03
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Multizone chamber
156345, 20429825, 20429835, C23C 1600
Patent
active
059320141
ABSTRACT:
A semiconductor device producing apparatus includes a first transporter which moves a substrate to a first unit to undergo at least a first process, and a second transporter, other than the first transporter, which moves the substrate to a second unit, to undergo at least a second process.
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Hayashi Tetsuya
Hirose Minoru
Inomata Tsuyoshi
Nozaki Koji
Okuyama Kazunori
Alejandro Luz
Bueker Richard
Fujitsu Limited
Fujitsu Tohoku Electronics Ltd.
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