Apparatus for producing semiconductor device

Details Apparatus for producing semiconductor device Apparatus for producing semiconductor device

1994-03-22

1997-03-11

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

117200, 118719, 118728, C23C 1600

Patent

active

056096887

ABSTRACT:
A semiconductor device producing method includes the steps of (a) subjecting a substrate which is transported by first transport means to at least a first process within a first unit, and (b) subjecting the substrate which is subjected to the step (a) and is transported by second transport means other than the first transport means to at least a second process within a second unit.

REFERENCES:
patent: 5100502 (1992-03-01), Murdoch et al.
patent: 5288379 (1994-02-01), Namiki et al.
patent: 5344542 (1994-09-01), Maher et al.
patent: 5422889 (1995-06-01), Pollock et al.

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