Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1985-07-31
1986-08-05
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204192C, 204192D, C23C 1446
Patent
active
046041818
ABSTRACT:
A polymeric substrate 10 is coated with a metal oxide film 22 to provide oxidation protection in low earth orbital environments. The film contains about 4 volume percent polymer to provide flexibility.
A coil of polymer material 30, 42 moves through an ion beam 14 as it is fed between reels. The ion beam first cleans the polymer material surface and then sputters the film material from a target 24 onto this surface.
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J. L. Vossen et al., Thin Film Processes, Academic Press, New York, 1978, pp. 189-198, 515.
Banks Bruce A.
Mirtich Michael J.
Sovey James S.
Leader William T.
Manning John R.
Niebling John F.
Shook Gene E.
The United States of America as represented by the Administrator
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