Coating apparatus – Gas or vapor deposition – With treating means
Patent
1996-04-04
2000-08-22
Pianalto, Bernard
Coating apparatus
Gas or vapor deposition
With treating means
118 50, 118 69, 118202, 118244, 427259, 427264, 427270, 427271, 4273855, 427404, 4274071, 427487, 427532, 427555, 427559, C23C 1600, C23C 1400, B05C 100
Patent
active
061066273
ABSTRACT:
A method of improving the breakdown strength of polymer multi-layer (PML) capacitors is provided and of providing a window in food packaging is provided. The method comprises patterning the aluminum coating, either by selective removal of deposited aluminum or by preventing deposition of the aluminum on selected areas of the underlying polymer film. Apparatus is also provided for patterning metal deposition on polymer films comprising masking for defining regions in which metal is deposited. The apparatus comprises: (a) a rotating drum; (b) a monomer evaporator for depositing a monomer film on the rotating drum; (c) a radiation curing element for curing the monomer film to form a cross-linked polymer film; and (d) a resistive evaporator for depositing a metal film on the cross-linked polymer film. The foregoing elements are enclosed in a vacuum chamber. The masking comprising one of the following: (e1) a web mask provided with openings for depositing the metal film therethrough, the web mask including a portion adapted for positioning between the resistive evaporator for depositing the metal film on the cross-linked polymer film and the rotating drum; or (e2) a rotating element for transferring liquid from a source to the rotating drum, the rotating element adapted to transfer the liquid to the rotating drum after the monomer evaporator for depositing the polymer film and before the resistive evaporator for depositing the metal film.
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Pianalto Bernard
Sigma Laboratories of Arizona, Inc.
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