Apparatus for producing graded-composition coatings

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

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Details

20419212, 427282, 4272555, 118720, 118729, 118733, C23C 1400

Patent

active

048140562

ABSTRACT:
Apparatus for depositing a coating on at least one substrate where the coating includes at least two component materials where the relative percentages of the component materials with respect to each other varies through the thickness of the coating. The apparatus includes at least two deposition sources for respectively providing the two component materials, at least one mask having at least one aperture, the mask being disposed between at least one of said two deposition sources and the substrate, and a motion effecting mechanism for effecting relative motion between the substrate and the deposition sources to thus effect a predetermined variation of the relative percentages of the component materials as a function of at least the shape of the aperture in the mask.

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