Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1987-06-23
1989-03-21
Beck, Shrive
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419212, 427282, 4272555, 118720, 118729, 118733, C23C 1400
Patent
active
048140562
ABSTRACT:
Apparatus for depositing a coating on at least one substrate where the coating includes at least two component materials where the relative percentages of the component materials with respect to each other varies through the thickness of the coating. The apparatus includes at least two deposition sources for respectively providing the two component materials, at least one mask having at least one aperture, the mask being disposed between at least one of said two deposition sources and the substrate, and a motion effecting mechanism for effecting relative motion between the substrate and the deposition sources to thus effect a predetermined variation of the relative percentages of the component materials as a function of at least the shape of the aperture in the mask.
REFERENCES:
patent: 3170810 (1965-02-01), Kagan
patent: 3327683 (1967-06-01), Kerecman
patent: 3335030 (1967-08-01), Vercesi et al.
patent: 3561993 (1971-02-01), Geffcken
patent: 3573960 (1971-04-01), Duncan
patent: 3664948 (1972-05-01), Graffeo, Jr. et al.
patent: 3775285 (1973-11-01), Lane
patent: 3904503 (1975-09-01), Hanfmann
patent: 3933644 (1976-01-01), Skinner et al.
patent: 3968018 (1976-07-01), Lane et al.
patent: 3985635 (1976-10-01), Adam et al.
patent: 4047624 (1977-09-01), Dorenbos
patent: 4102768 (1978-07-01), Kearin et al.
patent: 4151064 (1979-04-01), Kuehnle
patent: 4184448 (1980-01-01), Aichert et al.
patent: 4204942 (1980-05-01), Chahroudi
patent: 4303489 (1981-12-01), Morrison, Jr.
patent: 4473455 (1984-09-01), Dean et al.
patent: 4581245 (1986-04-01), Nakamura et al.
patent: 4682565 (1987-07-01), Carrico
patent: 4692233 (1987-09-01), Casey
Bashore Alain
Beck Shrive
Ferguson Jr. Gerald J.
Vac-Tec Systems, Inc.
LandOfFree
Apparatus for producing graded-composition coatings does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for producing graded-composition coatings, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for producing graded-composition coatings will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-475298