Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1978-05-11
1980-05-27
Mack, John H.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204275, 204278, C25B 900, C25B 1508
Patent
active
042049407
ABSTRACT:
Foam is produced electrolytically in a liquid having foaming tendencies through the use of closely spaced electrodes of opposite polarity that are disposed in substantially upright dispositions within the body of liquid being treated. The electrodes extend from a position deep within the body to a point at or above the surface of the body, and the electrodes are so formed or are associated with such other structure that bubbles generated within the columnar treating region between the electrodes cannot escape from the electrodes until reaching the surface of the liquid, thereby being confined and exposed to the electrodes throughout the full extent of travel by the bubbles to the surface. By regulating the position of the bubble outlet relative to the surface of the liquid, the characteristics of the foam produced from the bubble discharge may be varied, e.g., locating the point of bubble discharge a very slight distance above the surface of the liquid produces a creamy, relatively viscous foam having small diameter bubbles compared to the foam produced with the discharge at a more elevated position in which instance bubbles of larger diameter appear in the foam.
REFERENCES:
patent: 2997430 (1961-08-01), Foyn
patent: 3104221 (1963-09-01), Hill
patent: 3330755 (1967-07-01), Mahany
patent: 3385779 (1968-05-01), Nishiba et al.
patent: 3871989 (1975-03-01), King
patent: 4075069 (1978-02-01), Shinohara et al.
Mack John H.
Valentine D. R.
LandOfFree
Apparatus for producing foam does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for producing foam, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for producing foam will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1118678