Apparatus for producing a uniform magnetic field over a large su

Details Apparatus for producing a uniform magnetic field over a large su Apparatus for producing a uniform magnetic field over a large su

1998-03-27

2000-10-24

Mercado, Julian A.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429815, 118500, 118723R, 118728, 156345, C23C 1434

Patent

active

061361666

ABSTRACT:
An apparatus for producing in a deposition system an aligned uniform magnetic field across a workpiece or a wafer having a large surface area includes spaced flux guides which are formed with tapered sections that narrow towards the central region of the wafer. Magnetic members which may be permanent magnets or electromagnets are disposed close to the wafer and co-act with the flux guides to achieve the desired uniform magnetic field. In this way, thin films deposited within the deposition system are formed with uniform thickness and magnetic properties.

REFERENCES:
patent: 4581118 (1986-04-01), Class et al.
patent: 4871433 (1989-10-01), Wagner et al.
patent: 5589039 (1996-12-01), Hsu
patent: 5630916 (1997-05-01), Gerrish et al.
patent: 5804041 (1998-09-01), Hurwitt

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