Apparatus for producing a semiconductor device utlizing successi

Details Apparatus for producing a semiconductor device utlizing successi Apparatus for producing a semiconductor device utlizing successi

1980-05-22

1982-11-16

McIntosh, John P.

Coating apparatus

With heat exchange, drying, or non-coating gas or vapor...

With solid heat exchange means contacting work

118412, 118415, H01L 21208

Patent

active

043590128

ABSTRACT:
An apparatus for producing a semiconductor device of epitaxial growth on a substrate utilizing successive solution growth, in which materials to be successively deposited are being dissolved in bore portions respectively interconnecting between holes of the higher temperature portion and holes of the lower temperature portion in a boat, and in which a cooling jig is coupled with the substrate provided at the hole of the lower temperature portion to effectively conduct substantially main part of heat of the dissolved materials through the substrate.

REFERENCES:
patent: 3665888 (1972-05-01), Bergh et al.
patent: 3692592 (1972-09-01), Marinelli
patent: 3762943 (1973-10-01), Winstel et al.
patent: 3785884 (1974-01-01), Lockwood
patent: 3933538 (1976-01-01), Akai et al.

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