Apparatus for producing a protective coating on substrates

Details Apparatus for producing a protective coating on substrates Apparatus for producing a protective coating on substrates

1993-11-19

1995-04-11

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723MW, 118715, C23C 1650

Patent

active

054054486

ABSTRACT:
A method and apparatus for applying a protective coating onto a substrate comprises a power supply for generating an amplitude-modulated alternating electromagnetic field in a vacuum chamber. A silicon-organic compound is supplied in a gaseous state into the vacuum chamber and is plasma polymerized onto the substrate in the chamber without powdery portions. Another process parameter for controlling coating rate is adjusted to be at a high level so that when the amplitude modulation is stopped, powdery portions do appear in the coating. Thus at high coating rates amplitude-modulation according to the invention avoids such powdery portions.

REFERENCES:
patent: 4615298 (1986-10-01), Yamazaki
patent: 4808258 (1989-02-01), Otsubo et al.
patent: 5006220 (1991-04-01), Hijikata et al.

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