Apparatus for producing a gas mixture by the saturation method

Details Apparatus for producing a gas mixture by the saturation method Apparatus for producing a gas mixture by the saturation method

1988-03-18

1989-08-29

Miles, Tim

Gas and liquid contact apparatus

With external supply or removal of heat

Temperature or humidity sensor

261122, 261153, 261157, 2611211, 220470, B01F 304

Patent

active

048615242

ABSTRACT:
To produce a gas mixture by the saturation method, liquid is fed from a stock vessel to a separate reaction vessel. A carrier gas enters through a dip tube into the liquid present in the reaction vessel and is saturated by the liquid. The reaction vessel consists, for example, of quartz and is disposed in a metal block connected to a temperature control system. A level sensor fitted to the reaction vessel controls a flow regulation instrument on the liquid feed. The volume of the reaction vessel is substantially smaller than the volume of the stock vessel. Only the temperature of the reaction vessel is controlled. Temperature control of the stock vessel is not required. The saturation process in the reaction vessel takes place uniformly, independently of the temperature and the level in the stock vessel.

REFERENCES:
patent: 2650808 (1953-09-01), Cohen et al.
patent: 3074700 (1963-01-01), Buttner, Sr. et al.
patent: 3360003 (1967-12-01), Parker
patent: 3618905 (1971-11-01), Primus
patent: 3875267 (1975-04-01), Seki et al.
patent: 4072243 (1978-02-01), Conant et al.
patent: 4276243 (1981-06-01), Partus
patent: 4353345 (1982-10-01), Ebihara
patent: 4545801 (1985-10-01), Miyajiri et al.
patent: 4563312 (1986-01-01), Takimoto et al.
patent: 4582480 (1986-04-01), Lynch et al.

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