Concentrating evaporators – Spray type – Gaseous current
Patent
1990-12-24
1992-09-22
Bascomb, Jr., Wilbur
Concentrating evaporators
Spray type
Gaseous current
159 404, 159 409, 159 481, 34 57A, 422187, 423474, B01D 118
Patent
active
051493985
ABSTRACT:
A process and apparatus utilizing the process of the present invention are provided to produce a fast dissolving, thermally sensitive granular product. The process employs a fluidized spray dryer having a fluidized bed of granular particles into which recycled off-sized product is fed after being agglomerated to adjust particle size. The spray dryer optionally can employ a second nozzle positioned above the fluidized bed. The process can be employed in the production of calcium hypochlorite water sanitizing chemical wherein the chlorine is supplied from a hypochlorous acid reactor and lime hypochlorinator.
REFERENCES:
patent: 2314159 (1943-03-01), Peebles
patent: 2901435 (1959-08-01), Robson
patent: 3110444 (1963-11-01), Eakins
patent: 3519054 (1970-07-01), Cavataio et al.
patent: 3748103 (1973-07-01), Bean et al.
patent: 3895994 (1975-07-01), Saguchi et al.
patent: 3969546 (1976-07-01), Saeman
patent: 4146578 (1979-03-01), Brennan et al.
patent: 4147761 (1979-04-01), Wojtowicz et al.
patent: 4364917 (1982-12-01), Tiedemann et al.
patent: 4370198 (1983-01-01), Dencs et al.
patent: 4380491 (1983-04-01), Joy et al.
patent: 4490403 (1984-12-01), Pisecky et al.
patent: 4849201 (1989-07-01), Smith et al.
patent: 4963226 (1990-10-01), Chamberlain
Hubbard John H.
Kurtz William L.
Shaffer John H.
Bascomb, Jr. Wilbur
D'Alessandro Ralph
Olin Corporation
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