Apparatus for processing wafers and the like

Details Apparatus for processing wafers and the like Apparatus for processing wafers and the like

1986-04-25

1988-06-14

Hornsby, Harvey C.

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

134 95, 134158, 134182, 15302, 15310, B08B 302

Patent

active

047505052

ABSTRACT:
An apparatus for processing semiconductor substrates (i.e., wafers) or the like by rotation of the same. The apparatus includes: a housing which defines a processing chamber therein; and an exhaust duct connected to the lower side portion of the chamber. A rotary member is rotatably mounted in the chamber, on which a plurality of wafers to be processed are held. At the upper side portion within the chamber an auxiliary chamber is provided. Undesired objects, such as water remaining on the wafers and vapor and dirts sprung from the wafers, are effectively expelled from the chamber, through both the exhaust duct and the auxiliary chamber.

REFERENCES:
patent: 2893410 (1959-07-01), Frekko
patent: 4316750 (1982-02-01), Gengler
patent: 4421131 (1983-12-01), Auvil, Jr.
patent: 4445281 (1984-05-01), Aigoo

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