Apparatus for processing substrates and method therefor

Details Apparatus for processing substrates and method therefor Apparatus for processing substrates and method therefor

2008-05-13

2008-05-13

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

Reexamination Certificate

active

11151870

ABSTRACT:
An apparatus (100) for processing substrates includes: a substrate cleaning device (20), which cleans the substrates with treating liquid; a developing device (40); and a treating liquid recovery system (30), which is connected with the cleaning device and the developing device. The treating liquid recovery system can convey the treating liquid from the cleaning device to the developing device. Thus the treating liquid that has been used in the cleaning device can be reused in the developing device. Therefore the apparatus can economize on treating liquid and reduce costs.

REFERENCES:
patent: 6159288 (2000-12-01), Satou et al.
patent: 6343882 (2002-02-01), Chang et al.
patent: 6857795 (2005-02-01), Lu et al.
patent: 7063094 (2006-06-01), Amai et al.
patent: 574696 (1977-10-01), None
patent: 554401 (2003-09-01), None

Affiliated with

Also associated with

Rating

Apparatus for processing substrates and method therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for processing substrates and method therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for processing substrates and method therefor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3934875