Apparatus for processing substrate surface

Details Apparatus for processing substrate surface Apparatus for processing substrate surface

1987-09-18

1989-06-13

Lacey, David L.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118 52, 118 50, 118 64, 118320, 134140, 134157, C23F 102

Patent

active

048389790

ABSTRACT:
An improved processing apparatus for a substrate surface, which provides uniform and smooth air flows A within the processing chamber 26, by which an even thin film of a processing solution can be formed on the substrate surface. Undersirable surplus processing solution is collected primarily in a first chamber 13. A second chamber 15 is provided which is separate from the first chamber and pneumatically communicated therewith through a slit 16.

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