Coating apparatus – Work holders – or handling devices
Patent
1998-09-14
2000-07-18
Edwards, Laura
Coating apparatus
Work holders, or handling devices
118 52, 118317, 118320, B05C 1302
Patent
active
060902051
ABSTRACT:
A method of processing a substrate having the steps of placing a substrate for forming an LCD on a support, mounting a cover on the substrate in such a manner that a clearance is formed from at least either surface of the substrate placed on the support, introducing developer or pure water into the clearance, bringing the developer or pure water into contact with at least either surface of the substrate, processing the substrate with the developer or pure water, removing the cover from the substrate, and discharging the substrate from the support.
REFERENCES:
patent: 3601029 (1971-08-01), Needleman
patent: 3721175 (1973-03-01), Needleman
patent: 4693211 (1987-09-01), Ogami et al.
patent: 4696885 (1987-09-01), Vijan
patent: 4755844 (1988-07-01), Tsuchiya et al.
patent: 4788992 (1988-12-01), Swainback et al.
patent: 4822639 (1989-04-01), Fujii et al.
patent: 4886012 (1989-12-01), Ikeno et al.
patent: 4899686 (1990-02-01), Toshima et al.
patent: 5095848 (1992-03-01), Ikeno
patent: 5405508 (1995-04-01), Kawakami et al.
patent: 5562772 (1996-10-01), Neoh
patent: 5678116 (1997-10-01), Sugimoto et al.
patent: 5689749 (1997-11-01), Tanaka et al.
patent: 5716673 (1998-02-01), Yen et al.
Sakai Mitsuhiro
Tateyama Kiyohisa
Edwards Laura
Tokyo Electron Limited
LandOfFree
Apparatus for processing substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for processing substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for processing substrate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2032457