Apparatus for processing silicon devices with improved temperatu

Details Apparatus for processing silicon devices with improved temperatu Apparatus for processing silicon devices with improved temperatu

1998-05-18

1999-12-14

Walberg, Teresa

Electric heating

Heating devices

With power supply and voltage or current regulation or...

374123, H05B 302

Patent

active

060021136

ABSTRACT:
Apparatus for processing a silicon workpiece uses reflected UV light to measure and control the workpiece temperature. A linearly polarized beam including UV light is directed onto a silicon surface to produce a reflected beam. The reflected beam is cross-polarized to null out much of the light, and the resulting residual reflectivity spectrum is determined. The temperature is determined from the characteristics of this spectrum. A workpiece heating station uses this measuring technique to accurately control the temperature of a silicon workpiece and temperature-dependent processing over a wide range of processing temperatures, including temperatures below 500.degree. C.

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