Apparatus for processing glass substrate

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

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20429801, 20429802, 20429809, 20429831, 118723R, 118728, 361234, 156345, 134105, 134166R, 134171, 134201, 134137, C23C 1434, C23C 16458, C23F 102, H01L 21203, H01L 21302

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06120661&

ABSTRACT:
A glass substrate processing apparatus, part of which comprises a composite material, the composite material being formed of a matrix and a ceramic layer formed on a surface of the matrix by a thermal spraying method, the matrix being formed of a ceramic member and an aluminum-containing material filled in a texture of the ceramic member.

REFERENCES:
patent: 5909354 (1999-06-01), Harada et al.
patent: 5981913 (1999-11-01), Kadomura et al.

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