Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1999-06-07
2000-09-19
Diamond, Alan
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429801, 20429802, 20429809, 20429831, 118723R, 118728, 361234, 156345, 134105, 134166R, 134171, 134201, 134137, C23C 1434, C23C 16458, C23F 102, H01L 21203, H01L 21302
Patent
active
06120661&
ABSTRACT:
A glass substrate processing apparatus, part of which comprises a composite material, the composite material being formed of a matrix and a ceramic layer formed on a surface of the matrix by a thermal spraying method, the matrix being formed of a ceramic member and an aluminum-containing material filled in a texture of the ceramic member.
REFERENCES:
patent: 5909354 (1999-06-01), Harada et al.
patent: 5981913 (1999-11-01), Kadomura et al.
Hirano Shinsuke
Kadomura Shingo
Takatsu Kei
Diamond Alan
Kananen Ronald P.
Sony Corporation
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