Apparatus for processing a semiconductor

Details Apparatus for processing a semiconductor Apparatus for processing a semiconductor

2006-08-29

2006-08-29

Wilczewski, M. (Department: 2822)

Coating apparatus

Gas or vapor deposition

C118S719000, C118S722000, C118S7230AN, C118S7230ER, C118S7230ER, C118S620000, C118S641000, C118S900000, C118S050100, C438S166000, C438S907000, C438S908000

Reexamination Certificate

active

07097712

ABSTRACT:
A multi-chamber system for providing a process of a high degree of cleanliness in fabricating semiconductor devices such as semiconductor integrated circuits. The system comprises a plurality of vacuum apparatus (e.g., a film formation apparatus, an etching apparatus, a thermal processing apparatus, and a preliminary chamber) for fabrication of semiconductor devices. At least one of these vacuum apparatuses is a laser.

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