Apparatus for preventing rapid temperature variation during...

Details Apparatus for preventing rapid temperature variation during... Apparatus for preventing rapid temperature variation during...

2005-07-19

2005-07-19

Paik, Sang Y. (Department: 3742)

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

C118S724000

Reexamination Certificate

active

06919541

ABSTRACT:
An apparatus for fabricating a semiconductor device, whereby a semiconductor wafer is thermally treated with a wafer treatment device. The semiconductor wafer is delivered with a conveyer to the wafer treatment device. The temperature of the conveyer is controlled to have an optimum temperature by an arm heater and an arm cooler.

REFERENCES:
patent: 4604572 (1986-08-01), Horiuchi et al.
patent: 4775776 (1988-10-01), Rahn et al.
patent: 4778382 (1988-10-01), Sakashita
patent: 5001423 (1991-03-01), Abrami et al.
patent: 5034688 (1991-07-01), Moulene et al.
patent: 5151871 (1992-09-01), Matsumura et al.
patent: 5302209 (1994-04-01), Maeda et al.
patent: 5462603 (1995-10-01), Murakami
patent: 5851298 (1998-12-01), Ishii
patent: 5976258 (1999-11-01), Kleiner
patent: 3-95952 (1991-04-01), None
patent: 4-32226 (1992-02-01), None
patent: 40403226 (1992-02-01), None
patent: 4-277618 (1992-10-01), None
patent: 5-283501 (1993-10-01), None
patent: 09298204 (1997-11-01), None
patent: 9-298204 (1997-11-01), None

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