Apparatus for preventing particle deposition in a capacitance di

Details Apparatus for preventing particle deposition in a capacitance di Apparatus for preventing particle deposition in a capacitance di

1998-03-11

1999-09-07

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723FE, 118715, 73715, 73718, 73724, C23C 1600

Patent

active

059481692

ABSTRACT:
Apparatus for reducing a material deposition in a housing is disclosed herein. The apparatus includes: a first pressure sensing device which senses a pressure in a reaction chamber, a pumping device for pumping the vapor from the reaction chamber to the pumping device, a valve that is opened when the pressure is larger than a first value and smaller than a second value, a bypass valve which is closed when the pressure is larger than the third value and smaller than the fourth value, a check valve that blocks a gas flow from the check valve to the bypass valve, and a pipe for connecting all of the above.

REFERENCES:
patent: 5433780 (1995-07-01), Ikeda et al.
patent: 5728222 (1998-03-01), Barbee et al.

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