Apparatus for preventing clouding of a semiconductor wafer

Details Apparatus for preventing clouding of a semiconductor wafer Apparatus for preventing clouding of a semiconductor wafer

1989-10-31

1991-08-13

Nozick, Bernard

Gas separation

With nonliquid cleaning means for separating media

Solid agent cleaning member movingly contacts apparatus

55316, 553852, 55387, 981153, B01D 4700

Patent

active

050393219

ABSTRACT:
An apparatus for preventing clouding of a mirror-finished semiconductor wafer in a semiconductor wafer treating zone by controlling an internal atmosphere in the semiconductor wafer treating zone. The apparatus has an air conditioner for introducing the air from an external environment into the semiconductor wafer treating zone, and a removing device disposed in the air conditioner or between the air conditioner and the external environment for removing at least part of the sulfur oxides out of the sulfur oxides and nitrogen oxides in the air introduced from the external environment. The air introduced through the air conditioner and the cleaning device forms an atmosphere including a sulfur oxide concentration of 60 ng/l or less in the semiconductor wafer treating zone.

REFERENCES:
patent: 4374813 (1983-02-01), Chen et al.
patent: 4549472 (1985-10-01), Endo et al.
patent: 4630530 (1986-12-01), Eckstrom et al.
patent: 4684510 (1987-08-01), Harkins

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