Apparatus for preparing thin film optical coatings on substrates

Details Apparatus for preparing thin film optical coatings on substrates Apparatus for preparing thin film optical coatings on substrates

1987-05-14

1989-03-28

Valentine, Donald R.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

118500, 118730, C23C 1400, B05C 1302

Patent

active

048161330

ABSTRACT:
A system for coating recipient surfaces of substrates with thin optical film by the deposition of coating material. The system comprises a vacuum chamber, a target within the chamber for providing a sputtered flux and an ion beam gun adapted to direct ion emissions within the chamber onto the target to sputter the flux which is then moved in a path of travel to the recipient surfaces of the substrates for constituting the coating material. The system also comprises a cylindrical support means within the chamber to position the substrates with their recipient surfaces located in a primary plane intersecting the path of travel of the coating material and drive means to move the cylindrical support means and substrates with their recipient surfaces within the primary plane while coating material is being deposited upon the recipient surfaces. Adjustment means are also provided to vary the position of the recipient surfaces radially, axially and angularly.

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patent: 4609450 (1986-09-01), Seimiya et al.

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