Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Soap making
Patent
1997-06-13
1999-11-09
Tran, Hien
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Soap making
422131, 422133, 3661521, 3661602, 3661815, B01J 1400
Patent
active
059808365
ABSTRACT:
An improved method and apparatus for preparing low-concentration polyaluminosilicate microgels from a water soluble silicate and a strong acid in which the silicate and acid are mixed at a rate to produce a Reynolds number of at least 4000, the mixture is aged and then diluted to a silica concentration of not more than 1.0 wt. %. The method achieves reduced silica deposition during the preparation of the microgels.
REFERENCES:
patent: 2217466 (1940-10-01), Baylis
patent: 2234285 (1941-03-01), Schworm et al.
patent: 2310009 (1943-02-01), Baker et al.
patent: 2444774 (1948-07-01), Hay
patent: 2466842 (1949-04-01), Elston
patent: 2769785 (1956-11-01), Walker
patent: 4213950 (1980-07-01), Mahler
patent: 4554211 (1985-11-01), Akira et al.
patent: 4954220 (1990-09-01), Rushmere
patent: 5066420 (1991-11-01), Chevallier
patent: 5176891 (1993-01-01), Rushmere
patent: 5312595 (1994-05-01), Moffett et al.
Reynold C. Merrill, Activated Silica Sols in Water Treatment, 40, 1355-1359.
Reynold C. Merrill, Activated Silica--A New Chemical Eng Tool, 1, No. 1, 27-32, 1947.
L.L. Klinger, Improvements in the Coagulation of Surface Waters with Activated Silica, 122, 40-50, 1946.
Moffett Robert Harvey
Rushmere John Derek
E. I. Du Pont de Nemours and Company
Tran Hien
LandOfFree
Apparatus for preparing low-concentration polyaluminosilicate mi does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for preparing low-concentration polyaluminosilicate mi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for preparing low-concentration polyaluminosilicate mi will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1451476