Apparatus for preparing a semiconductor device, photo treatment

Details Apparatus for preparing a semiconductor device, photo treatment Apparatus for preparing a semiconductor device, photo treatment

1994-07-20

1995-05-09

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

1566551, H01L 213065, B44C 122, C23F 102

Patent

active

054136644

ABSTRACT:
A process for forming an etching pattern, which includes selectively irradiating a light to a clean surface of a material to be worked by etching so as to form radicals from a photoradical forming substance in an atmosphere of the substance, forming a modified portion having an etching resistance at a photo-irradiated portion of the surface, and then subjecting an unmodified portion of the surface of the material to be worked to an etching treatment, thereby forming an etching pattern corresponding to a pattern formed by the irradiation.

REFERENCES:
patent: 3326717 (1967-06-01), Gregor et al.
patent: 3346384 (1967-10-01), Gaynor
patent: 4668337 (1987-05-01), Sekine et al.
patent: 4698238 (1987-10-01), Hayasaka et al.
patent: 4761199 (1988-08-01), Sato
patent: 4857139 (1989-08-01), Tashiro et al.
patent: 4960675 (1990-10-01), Tsuo et al.
patent: 5024716 (1991-06-01), Sato
patent: 5024724 (1991-06-01), Hirono et al.
Taneya, et al., "Photo-Oxidation of GaAs for In Situ Patterned-Mask Formation Prior to Chlorine Gas Etching," Appl. Phys. Lett., vol. 56, No. 1, Jan. 1990, pp. 98 through 100.
Sesselmann, et al., "Chlorine Surface Interaction and Laser-Induced Surface Etching Reactions," J. Vac. Sci. Tech. vol. B3, No. 5, Sep. 1985, pp. 1507 through 1512.
Oehrlein, et al., "Plasma-Deposited Fluorocarbon Films on Silicon Studied by Ellipsometry," 2194 Thin Solid Films, vol. 143, No. 3, Oct. 1986, pp. 269 through 278.
Patent Abstracts of Japan, Kokai No. 62-217245, vol. 12, No. 79, Mar. 1988.
Patent Abstracts of Japan, Kokai No. 63-204259, vol. 12, No. 492, Dec. 1988.
Stetson, "Producing Reduced Reflectivity Master Mask on Working Plate," IBM Technical Disclosure Bulletin, vol. 18, No. 10, Mar. 1976, p. 3167.
Judge, et al., "Antireflective Chrome Photomasks," IBM Technical Bulletin vol. 13, No. 3, Aug. 1970, p. 752.

Affiliated with

Also associated with

Rating

Apparatus for preparing a semiconductor device, photo treatment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for preparing a semiconductor device, photo treatment , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for preparing a semiconductor device, photo treatment will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1702608