Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1992-03-30
1993-11-23
Evans, F. L.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
250548, 382 8, G01B 1100
Patent
active
052649199
ABSTRACT:
An apparatus for positioning a semiconductor wafer on which a pattern of circuits with a reference mark is formed consists of a radiation section for radiating a light to the wafer, a multi-visual-field mirror pipe for optically branching the light into a plurality of lights, magnifying lenses for respectively magnifying the branched lights, photoelectric transferring devices for transferring the magnified lights into picture signals, a pattern recognition and calculation section for automatically recognizing the reference mark of the pattern and for calculating the difference between a target position and the position of the reference mark, position correcting sections for determining the movement of the wafer in X and Y directions to reduce the difference to zero, a moving section for moving the wafer in the X and Y directions according to the movement of the wafer, and a control section for controlling the order of the branched lights which are processed by the pattern recognition and calculation section.
REFERENCES:
patent: 4757550 (1988-07-01), Uga
Evans F. L.
Kabushiki Kaisha Toshiba
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