Apparatus for plasma treatment using electron cyclotron resonanc

Details Apparatus for plasma treatment using electron cyclotron resonanc Apparatus for plasma treatment using electron cyclotron resonanc

1993-10-04

1995-07-18

Owens, Terry J.

Coating apparatus

Gas or vapor deposition

With treating means

118723MA, 427571, 427575, C23C 1650

Patent

active

054337887

ABSTRACT:
A plasma treatment apparatus for forming a thin film on a substrate in a vacuum vessel includes a magnetic field generator which can be positioned inside or outside the vacuum vessel, and a microwave source. The magnetic field strength is controllable such that an electron cyclotron resonance (ECR) area is defined near the substrate. The magnetic field generator can be arranged so that plasma and reactive gas introduction ports are on the microwave introduction side of the ECR area and the substrate is on the opposite side of the ECR area. Alternatively, a gas introduction port can be positioned such that reactive gas is introduced into the ECR area or onto the substrate.

REFERENCES:
patent: 4401054 (1983-08-01), Matsuo et al.
patent: 4438368 (1984-03-01), Abe et al.
patent: 4512867 (1985-04-01), Andreev et al.
patent: 4532199 (1985-07-01), Ueno
patent: 4559100 (1985-12-01), Ninomiya et al.
patent: 4585541 (1986-04-01), Miyake et al.
patent: 4673586 (1987-06-01), White
patent: 4683838 (1987-08-01), Kimura et al.
patent: 4727293 (1988-02-01), Asmussen et al.
patent: 4776918 (1988-10-01), Otsubo et al.
patent: 5275798 (1994-01-01), Aida
Karr, P.C., "Vacuum Deposition of Material Films on Substrates Utilizing Controlled Plasma," IBM Technical Disclosure Bulletin, vol. 19, No. 5 (Oct. 1976) pp. 1518-1520.

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