Apparatus for plasma surface treating and preparation of membran

Details Apparatus for plasma surface treating and preparation of membran Apparatus for plasma surface treating and preparation of membran

1988-05-09

1990-09-18

Lawrence, Evan

Coating apparatus

Gas or vapor deposition

With treating means

118 501, C23C 1650

Patent

active

049570625

ABSTRACT:
An apparatus suitable for plasma surface treating (e.g., forming a membrane layer on a substrate surface) comprises a plasma generation section which is operable at least at substantially atmospheric pressure and is in communication via at least one plasma inlet (e.g., a nozzle) with an enclosed plasma treating section which is operable at a lower pressure than the plasma generation section, and wherein the plasma treating-section is in communication with an inlet for a fluid (e.g., polymerizable) reactant used to form a layer on the substrate surface.

REFERENCES:
patent: 4596718 (1986-06-01), Gruner
English translation of Japanese Kokai Patent No. Sho 62-120477 to Den et al., U.S. Patent and Trademark Office, PTO 89-1110, Washington, D.C., Feb. 1989.
Boenig, H. V., "Plasma Science and Technology," Ithaca, N.Y., Cornell University Press, p. 18.
7th International Symposium on Plasma Chemistry, Jul. 1-5, 1985, vol. 2, "A New Approach of Plasma Deposition", G. M. W. Kroesen, pp. 698-703.

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