Apparatus for plasma enhanced chemical vapor deposition comprisi

Details Apparatus for plasma enhanced chemical vapor deposition comprisi Apparatus for plasma enhanced chemical vapor deposition comprisi

1993-12-20

1995-07-18

Kunemund, Robert

Coating apparatus

Gas or vapor deposition

With treating means

156345, 118715, 118723R, C23C 1650, H01L 2100

Patent

active

054337860

ABSTRACT:
An apparatus useful in preparing a coated substrate is disclosed. The substrate is coated with a plasma generated polymer containing Si, O, C and H in specific atom ratio wherein the polymer also contains certain functional groups. A power density of about 106 to about 108 J/Kg is employed in the plasma polymerization process. The apparatus comprises a plasma generating vacuum reaction vessel utilizing parallel plate electrodes. One of the electrodes comprises a magnetically enhanced shower head. A magnet is positioned in the interior of the shower head in contact with both the inner surfaces of the upper and lower portion thereof to concentrate the magnetic field above the upper surface of the shower head.

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