Coating apparatus – Gas or vapor deposition – With treating means
Patent
1996-10-08
2000-09-05
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118723VE, 118726, C23C 1600
Patent
active
061126950
ABSTRACT:
A gas inlet, which also serves as a counter electrode, is located inside of a vacuum chamber made of an electrically insulating material. A container is mounted on a mandrel mounted on the gas inlet. The chamber is evacuated to a subatmospheric pressure. A process gas is then introduced into the container through the gas inlet. The process gas is ionized by coupling RF power to a main electrode located adjacent an exterior surface of the chamber and to the gas inlet which deposits a plasma enhanced chemical vapor deposition (PECVD) thin film onto the interior surface of the container.
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Alejandro Luz
Breneman R. Bruce
Hodgson Serge J.
Nano Scale Surface Systems, Inc.
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