Apparatus for plasma CVD

Details Apparatus for plasma CVD Apparatus for plasma CVD

1989-05-30

1990-03-20

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118725, 118730, 118 501, 427 38, 427 39, C23C 1600

Patent

active

049091832

ABSTRACT:
An apparatus for Plasma CVD process comprises a vacuum chamber in which a plural number of substrates being placed along a circle and separately from each other, and means for passing a starting gas or an evacuating gas through gaps between the adjacent substrates.

REFERENCES:
patent: 3865072 (1975-02-01), Kirkman
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patent: 4223048 (1980-09-01), Engle
patent: 4282267 (1981-08-01), Kayel
patent: 4404076 (1983-09-01), Nakagawa et al.
patent: 4422407 (1983-12-01), Bessot
patent: 4438188 (1984-03-01), Shimatoni et al.
patent: 4466380 (1984-08-01), Jansen et al.
patent: 4501766 (1985-02-01), Suzuki et al.

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