Apparatus for physical vapor deposition

Details Apparatus for physical vapor deposition Apparatus for physical vapor deposition

1984-03-30

1985-04-30

Smith, John D.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192N, 204192EC, 118723, 118 501, 118726, C23C 1500

Patent

active

045142750

ABSTRACT:
An apparatus for physical vapor deposition comprising a vacuum casing one end of which is open; a sealing member provided at the opening of the casing; an electrode for physical vapor deposition, such as a target electrode or an electrode for heating evaporation, which is provided in the casing; and an exhaust hole for exhausting gases in the casing, which is provided at a predetermined wall portion of the casing. The apparatus may also be provided with a gas introducing hole and a bias electrode. The casing is integrally fitted to a body to be treated at the opening end portion thereof by means of the sealing member to form a vacuum chamber therein. This apparatus is compact and enables the surface treatment of a large or immovable body without moving the body.

REFERENCES:
patent: 2960457 (1960-11-01), Kuhlman
patent: 3839182 (1974-10-01), Sager
patent: 4190019 (1980-02-01), Hunt

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